Dr. John Wolfe, Professor of Electrical & Computer Engineering

Cullen College of Engineering, Electrical & Computer Engineering

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• Areas of expertise

  • High density electron beam addressed archival storage schemes
  • Ion and neutral beam lithography
  • Reactive ion etching
  • Nanofabrication
  • Superconductivity

• Awards

  • Abraham E. Dukler Distinguished Engineering Faculty Award-2007

• Publications

  • Roy, A., Craver, B., Ocola, L., and Wolfe, J. (2011). “Image noise in helium lithography,” Journ. Vac. Sci. Technol., vol 29, issue 4, pp. 041005-1-041005- 10.
  • Parikh, D., Craver, B., Nounu, H., Fong, F., and Wolfe, J., (2008). “Nanoscale pattern definition on non-planar surfaces using ion beam proximity lithography and conformal, plasma-deposited resist,” Journ. Microelectromechanical Systems, vol. 17, issue 3, pp. 735-740.
  • Craver, B., Nounu, H., Wasson, J., and Wolfe, J. (2008). “Neutral particle proximity lithography: Non-contact nanoscale printing without charge-related artifacts,” J. Vac. Sci. Technol. B, vol. 26, issue 6, pp. 1866-1870.
  • B. Craver, A. Roy, H. Nounu, and J. C. Wolfe, (2007). “Mechanical nanostepping for atom beam lithography,” J. Vac. Sci. Technol. B, vol. 25, issue 6, pp. 2192-2194.
  • Guo, H., Craver, B., Reynolds, J., and Wolfe, J. (2007). “Design studies for a high brightness, energetic neutral atom source for proximity lithography,” J. Vac. Sci. Technol. B, vol. 25, issue 6, pp. 2188-2191.
  • Parekh, V., E C., Smith, D., Ruiz, A., Wolfe, J., Ruchhoeft, P., Svedberg, E., Khizroev, S., and Litvinov, D. (2006). "Fabrication of a High Anisotropy Nanoscale Patterned Magnetic Recording Medium For Data Storage Applications," Nanotechnology 17, issue 9, pp. 2079-2082.
  • (Invited Review) Wolfe, J. C. and Craver, B., (2008). “Neutral Particle Lithography: A simple solution to charge related artifacts in ion beam proximity printing,” Journal of Physics D, vol. 41, pp. 024007-024018.
  • Bhargava, M., Donner, W., Srivastava, A., and Wolfe, J. (2008). “Bragg diffraction, synchrotron x-ray reflectance, and x-ray photoelectron spectroscopy studies of low temperature plasma oxidation of native SiO2 on SOI”, J. Vac. Sci. Technol. B., vol. 26, issue 1, pp. 305-309.

  For more publications, see faculty website above or CV below.

• Patents

  • None available.

• Grants and Funded Research

  • Alignment technique for masked ion beam lithography. Patent number: 5160845
  • Sputtering method. Patent number: 5047394
  • Magnetically enhanced RIE process and apparatus. Patent number: 4983253
  • Device and method for manufacturing a particulate filter with regularly spaced micropores. Patent number: 8987688
  • Energetic neutral particle lithographic apparatus and process. Patent number: 7504619
  • Ion assisted deposition process including reactive source gassification. Patent number: 5415756
  • Method for translating a structured beam of energetic particles across a substrate in template mask lithography. Patent number: 7883831
  • Methods and devices for charged beam accessible data storage. Patent number: 4631704
  • Method for manufacturing a multimodal neural probe. Patent number: 8661663
  • Magnetically enhanced radio frequency reactive ion etching method and apparatus. Patent number: 5728261
  • Method and apparatus for doping silicon wafers using a solid dopant source and rapid thermal processing. Patent number: 5550082

  More research information in ResearchGate profile here.

• Curriculum Vitae

  • John Wolfe CV

• Contact information